Ferroelectric memory device

ABSTRACT

A ferroelectric memory device includes a first bit line, a second bit line provided adjacent to the first bit line, a first memory cell block including a first terminal, a second terminal, and a plurality of memory cells connected in series between the first and second terminals and arranged in a first direction along the first bit line connected to the first terminal by a first block select transistor, a second memory cell block including a plurality of memory cells, and a plurality of first contacts arranged between the first and second memory cell blocks, each first contact connecting the upper electrode and drain or source electrode of one memory cell.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromprior Japanese Patent Application No. 2004-089474, filed Mar. 25, 2004,the entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a ferroelectric memory device thatstores data in a nonvolatile manner using a ferroelectric capacitor.

2. Description of the Related Art

Recently, a great deal of attention has been paid to a ferroelectricmemory (FeRAM: Ferroelectric Random Access Memory), as one type of thesemiconductor memories, which is a nonvolatile memory that uses aferroelectric capacitor. The FeRAM, which is nonvolatile, can berewritten an order of 10¹² times, and the reading or writing time isabout the same as that of the DRAM. Further, the FeRAM can be operatedat a low voltage of 2.5 to 5V. Due to these remarkable advantages, it isexpected that the FeRAM replaces the entire memory market in nearfuture.

An example of the FeRAM is disclosed in Jpn. Pat. Appln. KOKAIPublication No. 10-255483 filed by the inventor of the presentinvention. This FeRAM has such a structure in which both terminals ofthe ferro-electric capacitor are connected to the source and drain ofthe cell transistor to form a memory cell MC, and a plurality of suchmemory cells MC are connected in series to form a memory cell block.(This FeRAM will be called “a series connected TC unit typeferro-electric RAM” hereinafter.)

FIG. 7 is a diagram illustrating the layout of an example of thestructure of the series connected TC unit type ferroelectric RAM. FIG. 8is a diagram showing a cross section of the structure shown in FIG. 7taken along the line VIII-VIII.

A gate electrode 32 is formed via a gate oxide 42 on a semiconductorsubstrate 30. The gate electrode 32 serves as a word line WL. Adiffusion layer (AA: Active Area) 31 is provided on both sides of thegate electrode 32 in the semiconductor substrate 30, and the diffusionlayer serves as source and drain electrodes of the cell transistor onboth sides, respectively.

A ferroelectric capacitor is provided above the cell transistor, and theferroelectric capacitor includes a lower electrode 33, a ferroelectricfilm 34 and an upper electrode 35. The lower electrode 33, ferroelectricfilm 34 and upper electrode 35 are laminated one on another in thisorder to form the ferroelectric capacitor. The lower electrode 33 andthe diffusion layer 31 are connected to each other via an AA-LE contact36.

The upper electrodes 35 of two ferromagnetic capacitors formed adjacentto each other in one direction are connected together by a metal 38. Themetal 38 and the diffusion layer 31 are connected to each other via anAA-M contact 39. A bit line 40 is provided above the memory cell MC. Aninsulating oxide layer 41 is formed on the semiconductor substrate 30.

In the ferroelectric memory, which has the above-described structure,the AA-M contact 39 is formed between the upper electrodes 35 within thesame memory cell block. Due to the AA-M contact 39 formed there, theextending directional area of the bit line 40 of the ferroelectricmemory is increased.

Due to the above-described structure, the bit line 40 is extended andtherefore the parasitic capacity of the bit line is increased. As theresult of increasing the parasitic capacity of the bit line, the readsignal amount of the bit line is decreased.

BRIEF SUMMARY OF THE INVENTION

According to an aspect of the present invention, there is provided aferroelectric memory device comprising: a first bit line; a second bitline provided adjacent to the first bit line; a first memory cell blockincluding a first terminal, a second terminal, and a plurality of memorycells connected in series between the first and second terminals andarranged in a first direction along the first bit line connected to thefirst terminal by a first block select transistor, the memory cells eachincluding a cell transistor having a gate, a source and a drainelectrode, and a ferroelectric capacitor having a lower electrodeconnected to the source or drain electrode, a ferroelectric filmprovided on the lower electrode and an upper electrode provided on theferroelectric film; a second memory cell block including a thirdterminal, a fourth terminal, and a plurality of memory cells connectedin series between the third and fourth terminals and arranged in thefirst direction, the third terminal connected to the second bit line bya second block select transistor, the memory cells each including a celltransistor having a gate, a source and a drain electrode, and aferroelectric capacitor having a lower electrode connected to the sourceor drain electrode, a ferroelectric film provided on the lower electrodeand an upper electrode provided on the ferroelectric film; and aplurality of first contacts arranged between the first and second memorycell blocks, each first contact connecting the upper electrode and drainor source electrode of one memory cell.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING

FIG. 1 is a circuit diagram of an FeRAM according to an embodiment ofthe present invention;

FIG. 2 is a diagram showing the layout of the structure of the FeRAMshown in FIG. 1;

FIG. 3 is a diagram showing a cross section taken along the line III-IIIindicated in FIG. 2;

FIG. 4 is a diagram briefly illustrating the layout of two ferroelectriccapacitors 2 on the bit line BL side and two ferroelectric capacitors 2on the bit line /BL side;

FIG. 5 is a diagram showing a cross section taken along the line V-Vindicated in FIG. 4;

FIG. 6 is a diagram showing a cross section taken along the line VI-VIindicated in FIG. 4;

FIG. 7 is a diagram showing a layout of an example of the seriesconnected TC unit type ferroelectric RAM; and

FIG. 8 is a diagram showing a cross section taken along the lineVIII-VIII indicated in FIG. 7.

DETAILED DESCRIPTION OF THE INVENTION

An embodiment of the present invention, which has been proposed as asolution to the drawback of the prior art technique described above,will now be described with reference to accompanying drawings. In thefollowing descriptions, structural elements having the same function andstructure as those mentioned above will be designated by the samereference numerals, and the explanations therefore will not be repeatedunless they are necessary.

FIG. 1 is a circuit diagram of FeRAM according to the embodiment of thepresent invention. The FeRAM is a series connected TC unit typeferroelectric RAM.

In this figure, both terminals of a ferroelectric capacitor 2 areconnected to source and drain electrodes of a cell transistor 1,respectively, and thus one memory cell MC is formed. A plurality of suchmemory cells MC are connected in series to form a memory cell block 5.One of terminals of each memory cell block is connected to a bit line BLor /BL via a block selection transistor 3. The other terminal of eachmemory cell block is connected to a plate line PL.

A gate electrode of the block selection transistor 3 is connected to ablock selection line BS. Thus, a block selection signal is supplied tothe gate electrode of the block selection transistor 3. A gate electrodeof the cell transistor 1 is connected to a word line WLn. A bit linepair made of bit lines BL and /BL are connected to a sense amplifiercircuit (SA) 4.

FIG. 2 is a layout diagram illustrating the structure of the FeRAM shownin FIG. 1. FIG. 3 is a diagram showing a cross section taken along theline III-III indicated in FIG. 2.

A gate electrode 12 is formed via a gate oxide 22 on a semiconductorsubstrate 10. The gate electrode 12 serves as a word line WL. Adiffusion layer (AA: Active Area) 11 is provided on both sides of thegate electrode 12 in the semiconductor substrate 10, and the diffusionlayer 11 serves as source and drain electrodes of the cell transistor 1on both sides, respectively. As described above, a plurality of theabove-explained cell transistors 1 are connected in series within thesame memory cell block. More specification, the source or drainelectrode of one cell transistor 1 is connected to the source or drainelectrode of another cell transistor provided adjacent to the above celltransistor 1, respectively. In this embodiment, the source or drainelectrodes of two cell transistors adjacent to each other are formed inthe common diffusion layer 11.

It should be noted here that in the case where the source or drainelectrodes of two cell transistors 1 adjacent to each other are formedin separate diffusion layers 11, the contact between the cell transistor1 and the ferroelectric capacitor 2 is required for each of thediffusion layers 11, although the present invention is not limited tosuch a structure.

A ferroelectric capacitor 2 is provided above the cell transistor 1, andthe ferroelectric capacitor 2 includes a lower electrode (LE) 13, aferroelectric film 14 and an upper electrode (UE) 15. The lowerelectrode 13, ferroelectric film 14 and upper electrode 15 are laminatedone on another in this order to form the ferroelectric capacitor 2.Lower electrodes 13 of two ferroelectric capacitor 2 formed adjacent toeach other on one side are shared. The lower electrodes 13 and thediffusion layer 11 are connected to each other via an AA-LE contact 16.The AA-LE contact 16 is provided for each of the lower electrodes 13 innumber.

The upper electrodes 15 of two ferromagnetic capacitors formed adjacentto each other in the other direction are connected together by a metal18. That is, the lower electrode of one ferroelectric capacitor 2 andthe lower electrode 13 of another ferroelectric capacitor 2 adjacent tothe mentioned capacitor 2 on one side are commonly used, and the upperelectrode 15 of that one ferroelectric capacitor 2 is connected to theupper electrode 15 of still another adjacent ferroelectric capacitor 2adjacent on the other side. The upper electrode 15 and the metal 18 areconnected to each other via an UE-M contact 17. The metal 18 and thediffusion layer 11 are connected to each other via an AA-M contact 19.The AA-M contact 19 is provided for each of the metals 18 in number.

A bit line 20 is provided above the memory cell MC. The memory cellblock 5 is connected to the bit line via the block section transistor 3.The bit line BL20 and the bit line /BL20 are provided to be adjacent andin substantially parallel to each other. An insulating oxide layer 21 isformed on the semi-conductor substrate 10.

It should be noted that the AA-M contact 19 is not provided between theupper electrodes within the same memory cell block. More specifically,the AA-M contact 19 connected to one memory cell block 5 on the bit lineBL side and the AA-M contact 19 connected to another memory cell block 5on the bit line /BL side are provided between the upper electrodes 15 ofthese memory cell blocks 5.

Further, the AA-M contact 19 connected to one memory cell block 5 on thebit line BL side and the AA-M contact 19 connected to another memorycell block 5 on the bit line /BL side are arranged at positionscomplimentary to each other so that they do not overlap in a verticaldirection to the extending direction of the bit line BL. The AA-Mcontact 19 is provided between a midpoint between the two upperelectrodes 15 connected to the AA-M contact 19 and a midpoint betweenthe two upper electrodes that share the lower electrode 13.

Each of the metals 18 has such a shape that connects two upperelectrodes 15 and one AA-M contact 19 to each other. More specifically,the metal 18 on the bit line BL side has an overhang projecting to thebit line /BL side. The AA-M contact 19 is connected to the overhang ofthe metal 18. The diffusion layer 11 connected to the AA-M contact 19has substantially the same shape as that of the metal wiring layer 18.

Next, the reason why the FeRAM that has the structure described in thisembodiment can reduce the area will now be described. FIG. 4 is adiagram briefly illustrating the layout of two ferroelectric capacitors2 on the bit line BL side, that share a lower electrode and twoferroelectric capacitors 2 on the bit line /BL side, that are locatedadjacent to the above two ferroelectric capacitors 2, respectively. FIG.5 is a diagram showing a cross section taken along the line V-Vindicated in FIG. 4, and FIG. 6 is a diagram showing a cross sectiontaken along the line VI-VI indicated in FIG. 4.

In FIG. 4, the region indicated by dashed lines expresses an occupyingarea per one memory cell MC. The symbol “X” indicates a lateral lengthof the occupying area (in the extending direction of the bit line),whereas “Y” indicates a vertical length of the occupying area. Theferroelectric capacitor 2 has a tapered shape as shown in FIGS. 5 and 6for the convenience of the FE RAM manufacturing process, and thereforethe relationship (1) is established.X<Y  (1)

The occupying area Ac per one memory cell MC in the case where the AA-Mcontact 19 is provided between the upper electrodes within the samememory cell block can be expressed by the following equation:Ac=Y(X+cd)  (2)

-   -   where “cd” is the length that increases as an AA-M contact 19 is        added.

As compared to the above, the occupying area Ac of the embodiment of thepresent invention can be expressed by the following equation:Ap=X(Y+cd)  (3)

Therefore, from the relationship (1), the following relationship can beestablished:Ap<Ac

As can be understood from this relationship, the embodiment of thepresent invention can reduce the occupying area as compared to the casewhere the AA-M contact 19 is provided between the upper electrodeswithin the same memory cell block.

As described above in detail, according to the embodiment of the presentinvention, the AA-M contact 19 that connects the upper electrode 15 ofthe ferro-electric capacitor 2 and the diffusion layer 11 of the celltransistor 1 is placed between two memory cell blocks 5 adjacent to eachother. Further, the upper electrode 15 of one ferroelectric capacitor 2is connected by means of the metal 18 to the upper electrode 15 ofanother ferroelectric capacitor 2 provided on one side adjacent to theabove capacitor 2. Further, the lower electrode 13 of that oneferro-electric capacitor 2 and the lower electrode 13 of still anotherferroelectric capacitor 2 provided on the other side adjacent to thecapacitor 2 are shared. Further, each of the ferroelectric capacitor 2is formed to have such a tapered shape that reduces its width towardsthe upper electrode 15.

With the above-summarized structure of this embodiment, the occupyingarea per one memory cell MC can be decreased, and therefore the circuitarea of the FeRAM can be reduced.

Further, there is not AA-M contact 19 provided between the upperelectrodes within the same memory cell block, the length of the bit line(in its extending direction) can be shortened. With this structure, theparasitic capacitance of the bit line can be reduced, and therefore theread signal amount of the bit line can be increase as a result.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the invention in its broader aspects isnot limited to the specific details and representative embodiments shownand described herein. Accordingly, various modifications may be madewithout departing from the spirit or scope of the general inventiveconcept as defined by the appended claims and their equivalents.

1. A ferroelectric memory device comprising: a first bit line; a secondbit line provided adjacent to the first bit line; a first memory cellblock including a first terminal, a second terminal, and a plurality ofmemory cells connected in series between the first and second terminalsand arranged in a first direction along the first bit line connected tothe first terminal by a first block select transistor, the memory cellseach including a cell transistor having a gate, a source and a drainelectrode, and a ferroelectric capacitor having a lower electrodeconnected to the source or drain electrode, a ferroelectric filmprovided on the lower electrode and an upper electrode provided on theferroelectric film; a second memory cell block including a thirdterminal, a fourth terminal, and a plurality of memory cells connectedin series between the third and fourth terminals and arranged in thefirst direction, the third terminal connected to the second bit line bya second block select transistor, the memory cells each including a celltransistor having a gate, a source and a drain electrode, and aferroelectric capacitor having a lower electrode connected to the sourceor drain electrode, a ferroelectric film provided on the lower electrodeand an upper electrode provided on the ferroelectric film; and aplurality of first contacts arranged between the first and second memorycell blocks, each first contact connecting the upper electrode and drainor source electrode of one memory cell.
 2. The ferroelectric memorydevice according to claim 1, wherein each of the first contacts isprovided between a first midpoint and a second midpoint, the firstmidpoint existing between the upper electrode connected to the firstcontact and the upper electrode provided on one side of the upperelectrode in the first direction, and the second mid point existingbetween the upper electrode connected to the first contact and the upperelectrode on the other side of the upper electrode in the firstdirection.
 3. The ferroelectric memory device according to claim 1,which further comprises a plurality of wiring portions, each connectingthe upper electrodes of two adjacent ferroelectric capacitors providedin one of the first and second memory cell blocks, and in which each ofthe first contacts is provided for, and connected to, one wiringportion.
 4. The ferroelectric memory device according to claim 3,wherein each of the first contacts is provided between a first midpointand a second midpoint, the first midpoint existing between the upperelectrode connected to the first contact and the upper electrodeprovided on one side of the upper electrode in the first direction, andthe second mid point existing between the upper electrode connected tothe first contact and the upper electrode on the other side of the upperelectrode in the first direction.
 5. The ferroelectric memory deviceaccording to claim 3, wherein the first contacts connected to the firstmemory cell block are arranged not to overlap the first contactsconnected to the second memory cell block, in a second direction that isperpendicular to the first direction.
 6. The ferroelectric memory deviceaccording to claim 3, wherein the wiring portions connected to the firstmemory cell block have overhangs, the wiring portions connected to thesecond memory cell block have overhangs which protrude toward theoverhangs of the wiring portions connected to the first memory cellblock, and the first contacts are connected to the overhangs.
 7. Theferroelectric memory device according to claim 3, further comprising aplurality of second contacts which connect the upper electrodes and thewiring portions.
 8. The ferroelectric memory device according to claim3, wherein each of the lower electrodes provided in the same memory cellblock is shared by two ferroelectric capacitors provided adjacent toeach other.
 9. The ferroelectric memory device according to claim 3,further comprising a plurality of third contacts which connect the lowerelectrodes and the source or drain electrodes.
 10. The ferroelectricmemory device according to claim 1, wherein each of the upper electrodeshas an area smaller than each of the lower electrodes.
 11. Theferroelectric memory device according to claim 1, wherein each of theferroelectric capacitors tapers, having a width gradually decreasingfrom the lower electrode toward the upper electrode.
 12. Theferroelectric memory device according to claim 1, wherein the source ordrain electrodes of the memory cells are formed in a plurality ofdiffusion layers, and the source or drain electrodes of every twoadjacent memory cells provided in the same memory cell block are formedin the same diffusion layer.
 13. The ferroelectric memory deviceaccording to claim 12, wherein the first contacts are connected to thediffusion layers, respectively.
 14. The ferroelectric memory deviceaccording to claim 12, wherein the lower electrodes are connected to thediffusion layers, respectively.
 15. The ferroelectric memory deviceaccording to claim 1, further comprising word lines which are connectedto the gate electrodes of the memory cells of each memory cell block,respectively.